The CNRS
Home IN2P3
Other CNRS sites
 
    Home> Laboratory Means
 

L.M.A.Means


 Deposition Systems

  Ion Beam Sputtering system installed in a class 1 clean room (size 2,4*2,4*2,2 m)
     
  
  Dual Ion Beam Sputtering system installed in a class 1 clean room : model SPECTOR from IonTech (Veeco) (size: diameter 1.1 m, height 0.9 m)
  
  
  Dual Ion Beam Sputtering system installed in a class 1 clean room (size 0,6*0,6*0,8 m)


  Ion Assisted Deposition system (VPTECH Citation 54") installed in a class 10000 clean room


  Radiofrequency magnetron sputtering system and CVD plasma system (LEYBOLD Z 550M) installed in a class 10000 clean room



  Radiofrequency sputtering system (CVC-BENDIX Equipments) installed in a class 10000 clean room




Optical Characterizations
      Absorption PDS (Photothermal Deflection System) benches at 633 nm, 1064 nm, 10.6 µm

    Absorption bench at 1064 nm, automatic mappings possibility on 100 mm diameter
            2         3          4  
     
      Scatterometer CASI (SMS, ex TMA) at 633 nm, 1064 nm, 10.6 µm

    CASI upgrade :  500 * 500 mm mappings possible

             

    Scattering Measurement of a Advanced Virgo IM mirror

     
      ZYGO wavelength shifting interferometer with a 18" beam expander (1064 nm), pupil diameter 450 mm: measurement of surface flatness below 0.5 nm RMS                         

      ZYGO Mark IV xp interferometer (633 nm), pupil diameter 100 mm
                            

       Phase Shift interferometer model MINIFIZ(1064 nm), pupil diameter 150 mm
                          

    Stitching interferometry with the Phase-Shift interferometer. Possibility to measure wavefronts with a sensitivity of 1 nm RMS up to 400 mm in diameter. This option has been developed in collaboration with the company MB OPTIQUE.

         


      R.B.A. bench : Measurement of the Relative Reflectivity, of the Birefringence and of the absorption (surface and bulk) on components up to 400 mm in diameter                        

      UV-Visible-Near IR spectrophotometer Lambda 1050 PERKIN-ELMER (3200-200 nm), three detectors available, URA accessory (Absolute reflectivity measurement) available
        
      UV-Visible-Near IR spectrophotometer Lambda 19 PERKIN-ELMER (3200-200 nm)
        
      
      FTIR spectrophotometer Nicolet Magna 760 (4000-400 cm-1)
        
     
      AutoEl III ellipsometer RUDOLPH (633 nm)
        
     
      Optical microscopes (Dark field, phase contrast and infrared (Research Devices))
     
      Optical profilometer MICROMAP, possibility to make mappings of punctual defects on 400 x 400 mm (sensitivity 0,3 µm)

    picture 3 : defects detection on a mirror diameter 350 mm (thickness 100 mm),
    picture 4 : defects detection on a mirror diameter 350 mm (thickness 200 mm)

     1             2          3    4



 Miscellaneous Means
      Nanoindenter NANO 500 (Micro Materials Limited)
        
      Bench to measure the mechanical quality factor Q
        
       
      Microdurometer VICKERS

      Test bench of the abrasion resistance (Grittington)
        
      Particles counter LASAIR 110 (PMS)
     
      Simulation program ot thin films (calcul and optimization of any type of multilayers with OPTILAYER and TFCALC

      Scanning electron microscope (Cambridge)
        
       
      X-ray microanalysis (KEVEX)
     

 

 

  Français

Laboratoire des Matériaux Avancés
(L.M.A.)