L.M.A.Means

 Deposition Systems

  Ion Beam Sputtering system installed in a class 1 clean room (size 2,4*2,4*2,2 m)
     
  

  Dual Ion Beam Sputtering system installed in a class 1 clean room : model SPECTOR from IonTech (Veeco) (size: diameter 1.1 m, height 0.9 m)
  
  

  Dual Ion Beam Sputtering system installed in a class 1 clean room (size 0,6*0,6*0,8 m)

  Ion Assisted Deposition system (VPTECH Citation 54") installed in a class 10000 clean room

Optical Characterizations

  Absorption PDS (Photothermal Deflection System) benches at 633 nm, 1064 nm, 10.6 µm

Absorption bench at 1064 nm, automatic mappings possibility on 100 mm diameter
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  Scatterometer CASI (SMS, ex TMA) at 633 nm, 1064 nm, 10.6 µm

CASI upgrade :  500 * 500 mm mappings possible

         


Scattering Measurement of a Advanced Virgo IM mirror
 

  ZYGO wavelength shifting interferometer with a 18" beam expander (1064 nm), pupil diameter 450 mm: measurement of surface flatness below 0.5 nm RMS                         



  ZYGO Mark IV xp interferometer (633 nm), pupil diameter 100 mm
                        



   Phase Shift interferometer model MINIFIZ(1064 nm), pupil diameter 150 mm
                      

Stitching interferometry with the Phase-Shift interferometer. Possibility to measure wavefronts with a sensitivity of 1 nm RMS up to 400 mm in diameter. This option has been developed in collaboration with the company MB OPTIQUE.

     



  R.B.A. bench : Measurement of the Relative Reflectivity, of the Birefringence and of the absorption (surface and bulk) on components up to 400 mm in diameter                        



  UV-Visible-Near IR spectrophotometer Lambda 1050 PERKIN-ELMER (3200-200 nm), three detectors available, URA accessory (Absolute reflectivity measurement) available
    


  Optical microscopes (Dark field, phase contrast and infrared (Research Devices))
 

  Optical profilometer MICROMAP, possibility to make mappings of punctual defects on 400 x 400 mm (sensitivity 0,3 µm)

picture 3 : defects detection on a mirror diameter 350 mm (thickness 100 mm),
picture 4 : defects detection on a mirror diameter 350 mm (thickness 200 mm)
 1             2          3    4

 Miscellaneous Means

  Bench to measure the mechanical quality factor Q
    
   

  Particles counter LASAIR 110 (PMS)
 

  Simulation program ot thin films (calcul and optimization of any type of multilayers with OPTILAYER and TFCALC)