L.M.A.Means

 Deposition Systems

  Ion Beam Sputtering system installed in a ISO3 clean room (size 2,4*2,4*2,2 m)- (c) Cyril Fresillon Photothèque CNRS
     

  Dual Ion Beam Sputtering system installed in a ISO3 clean room : model SPECTOR from IonTech (Veeco) (size: diameter 1.1 m, height 0.9 m) - (c) Cyril Fresillon Photothèque CNRS
  

  Dual Ion Beam Sputtering system installed in a ISO 3 clean room (size 0,6*0,6*0,8 m)

  Ion Assisted Deposition system (VPTECH Citation 54") installed in a ISO 5 clean room - (c) Cyril Fresillon Photothèque CNRS

Optical and Mechanical Characterizations

  Absorption PDS (Photothermal Deflection System) benches at 1064 nm and 1,5 µm - Mapping possible up to 30 cm in diameter - Surface and volume measurement

          
 

  Scatterometer CASI (ScatterWorks, ex TMA) at 633 nm, 1064 nm - Mapping possible on 40 cm in diameter

 

  ZYGO wavelength shifting interferometer (VERIFIRE) with a 18" beam expander (1064 nm), pupil diameter 450 mm: measurement of surface flatness below 0.5 nm RMS                         



   Phase Shift interferometer model MINIFIZ(1064 nm), pupil diameter 150 mm
                      



   OBSERVE bench(ESA) to measure the wavefront error of mirrors every nm from 510 to 950 nm, with variable incidence and variable polarization - Bench developed by the company IMAGINE OPTIQUE and installed at the LMA in the ISO3 clean room (bench developed to measure the Dichroic of the EUCLID satellite)
    



  UV-Visible-Near IR spectrophotometer Lambda 1050 PERKIN-ELMER (3200-200 nm), three detectors available, URA accessory (Absolute reflectivity measurement available)
    



spectrophotometer UV-Visible-Proche IR CARY 7000 Universal Measurement Spectrophotometer (UMS) AGILENT (3300-175 nm),
    
  

 Microscope optique Leica Leica DM6/M optical microscope, able to measure defects up to a size of 5 µm, automatic scanning of surfaces.
 


 Optical profilometer EOTECH - Microroughness measurement, Defects maps of 500*500 mm
     



  Three benches to measure the mechanical Quality factor Q (mechanical loss angle) based on the GeNS (Gentle Nodal Suspension) technique, measurements at room temperature and cryogenic temperature
              



  Simulation program ot thin films (calcul and optimization of any type of multilayers with OPTILAYER and TFCALC)